SPIE Photomask Technology | Industrial Goods | ||||||||||||||||||||||||||
Description:The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, mask-making, and wafer fabrication.Profile:Coverage Area: 58,000 Square FeetVisitors: Engineers and designers, Corporate managers from the mask making industry, Application and product developers, Mask and chip designers, Resist chemists, Quality assurance specialists, Experts in mask infrastructure and mask integration, People working in emerging mask technologies are the target visitors. Exhibitors: Profile for exhibit includes Electron-Beam Lithography, EUV, Metrology, Lasers, Nanotechnology, Optical/Laser Microlithography, Resist Technology and Processing, Software, Electronic Imaging Components. https://www.aspurcela.ge/asp-Trade_shows_-_file_-_trade_show_-_sid_-_5761.html
Organizer:Spie- International Society For Optical Engineering1000, 20th Street, Bellingham, United StatesOrganizer Profile:Electronics & Electricals, Fashion Accessories, Gifts & Handicrafts, Industrial Goods, Industrial Goods, Industrial Goods, Industrial Goods, Industrial Goods, Medical & Pharmaceutical, Railway, Shipping & Aviation, Scientific Instruments, Scientific Instruments, Scientific Instruments | |||||||||||||||||||||||||||
Posted by newsadmin | 10 May 2011, 23:49 | Trade Shows and Forums » |
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